The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 07, 2021

Filed:

Oct. 23, 2020
Applicant:

Salvia Bioelectronics B.v., Eindhoven, NL;

Inventors:

Daniel Schobben, Eindhoven, NL;

Hubert Martens, Eindhoven, NL;

Marjolein Schets, Eindhoven, NL;

Wim Pollet, Eindhoven, NL;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
A61N 1/36 (2006.01); A61N 1/05 (2006.01); A61M 25/09 (2006.01); A61M 25/06 (2006.01); A61B 17/34 (2006.01);
U.S. Cl.
CPC ...
A61N 1/0551 (2013.01); A61M 25/0662 (2013.01); A61M 25/09041 (2013.01); A61N 1/36075 (2013.01);
Abstract

In general, implantation of neurostimulation systems or device includes subcutaneous or percutaneous placement of at least the electrodes. Preferred are minimally invasive implantation procedures, systems and devices that can reliably operate for extended periods, and systems and devices providing a high degree of comfort for the subject. The implantation specialist may need to address adequate placement of the electrodes with respect to the nerve tissue to be stimulated, and to choose between one or more convenient locations for the elements of the system or device. Methods are provided comprising forming a firstand secondincision on opposite sides of a target location, and introducing a first introducer sheathunder the skin with a maximum internal transverse cross-section less than the further maximum transverse cross-sectionof an implantable stimulator. Such a method is advantageous if the maximum transverse cross-sectionof the further portion is at least 1.2 times greater than the maximum transverse cross-sectionof the first portion—the dimensions of the implantation tools may be reduced. A further method is provided wherein the first portionwith at least two electrodesis introduced in the skin layers between the nerve tissueto be stimulated and above or in the aponeurosis layer By being implanted deeper and/or more accurately, comfort and/or reliability for the subject may be improved. In addition, the chance that the stimulator is implanted under the nerve tissue is greatly increased.


Find Patent Forward Citations

Loading…