The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 31, 2021

Filed:

Feb. 11, 2019
Applicant:

Renesas Electronics Corporation, Tokyo, JP;

Inventors:

Yoshito Nakazawa, Tokyo, JP;

Yuji Yatsuda, Tokyo, JP;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/78 (2006.01); H01L 29/06 (2006.01); H01L 29/40 (2006.01); H01L 29/423 (2006.01); H01L 29/66 (2006.01); H01L 27/02 (2006.01); H01L 21/28 (2006.01); H01L 21/285 (2006.01); H01L 29/49 (2006.01); H01L 29/45 (2006.01);
U.S. Cl.
CPC ...
H01L 29/7808 (2013.01); H01L 21/28008 (2013.01); H01L 21/28556 (2013.01); H01L 27/0255 (2013.01); H01L 29/0696 (2013.01); H01L 29/407 (2013.01); H01L 29/4236 (2013.01); H01L 29/4238 (2013.01); H01L 29/42368 (2013.01); H01L 29/4916 (2013.01); H01L 29/66484 (2013.01); H01L 29/66545 (2013.01); H01L 29/66727 (2013.01); H01L 29/66734 (2013.01); H01L 29/7811 (2013.01); H01L 29/7813 (2013.01); H01L 29/456 (2013.01);
Abstract

A semiconductor device including a field-effect transistor having source and drain source regions, first and second gate electrodes and a protective diode connected to the transistor. The first gate electrode is formed over a first gate insulating film in a lower part of a trench. The second gate electrode is formed over a second gate insulating film in an upper part of the trench. The first gate electrode includes a first polysilicon film, and the second gate electrode includes a second polysilicon film, wherein an impurity concentration of the first polysilicon film is lower than an impurity concentration of the second polysilicon film.


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