The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 31, 2021
Filed:
Feb. 05, 2020
National University of Ireland, Galway, Galway, IE;
National University of Ireland, Galway, Galway, IE;
Abstract
Methods of processing a target material are disclosed. In one arrangement, a multilayer structure is irradiated with a radiation beam. The multilayer structure comprises at least a target layer comprising the target material and an additional layer not comprising the target material. The additional layer is metallic. The target layer is irradiated through the additional layer during the irradiation of the multilayer structure. A transfer of energy from the radiation beam to the target layer and to the additional layer is such as to cause a thermally-induced change in the target layer. The thermally-induced change comprising one or more of: crystal growth in the target material, increased carrier mobility in the target material, increased chemical stability in the target material, and increased uniformity of electrical properties in the target material.