The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 31, 2021
Filed:
Dec. 23, 2019
Applicant:
Beijing Naura Microelectronics Equipment Co., Ltd., Beijing, CN;
Inventors:
Yuchun Deng, Beijing, CN;
Chao Zhang, Beijing, CN;
Peng Chen, Beijing, CN;
Guoqing Qiu, Beijing, CN;
Mengxin Zhao, Beijing, CN;
Assignee:
BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD., Beijing, CN;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/34 (2006.01); C23C 14/34 (2006.01); C23C 14/35 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3405 (2013.01); C23C 14/3407 (2013.01); C23C 14/35 (2013.01); H01J 37/3435 (2013.01); H01J 2237/026 (2013.01); H01J 2237/20214 (2013.01); H01J 2237/332 (2013.01);
Abstract
The present disclosure provides a feeding structure, an upper electrode assembly, and a physical vapor deposition chamber and device. In the present disclosure a RF power is fed through the center of a first introduction member of the feeding structure and is evenly distributed onto a target by a plurality of distribution members.
Deng, Yuchun. (2021). Feeding structure, upper electrode assembly, and physical vapor deposition chamber and device (U.S. Patent No. 11107665). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11107665
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile