The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 31, 2021

Filed:

Aug. 09, 2018
Applicant:

Tata Consultancy Services Limited, Mumbai, IN;

Inventor:

Prasanta Kumar Panda, Bhubaneswar, IN;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06Q 10/04 (2012.01); G06F 17/18 (2006.01); G06K 9/62 (2006.01); G06N 3/02 (2006.01); G06N 5/04 (2006.01); G06N 7/00 (2006.01);
U.S. Cl.
CPC ...
G06Q 10/04 (2013.01); G06F 17/18 (2013.01); G06K 9/6215 (2013.01); G06K 9/6218 (2013.01); G06K 9/6219 (2013.01); G06N 3/02 (2013.01); G06N 5/04 (2013.01); G06N 7/00 (2013.01);
Abstract

Method and system for model fitting to hierarchical time series clusters is described. A plurality of time series to be analyzed are clustered as hierarchical time series clusters using Dynamic Time Warping (DTW) as the optimal distance measure to create time series hierarchical clusters. The method disclosed recognizes least dissimilarity time series in the hierarchical time series clusters, and a best fit model is identified for the time series. The same model is continued up the hierarchy along the branch of the hierarchical time series clusters till the model identified satisfies Error Tolerance (ET) and Error Difference (ED) criteria. The method reduces the model fitting time or model building time by more than 50%.


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