The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 31, 2021

Filed:

Dec. 18, 2017
Applicant:

Omron Corporation, KYOTO, JP;

Inventors:

Reiko Hattori, Souraku-gun, JP;

Kosuke Tsuruta, Sakai, JP;

Kota Miyamoto, Nara, JP;

Yuya Ota, Kyoto, JP;

Hideki Higashikage, Moriyama, JP;

Yuki Hirohashi, Nara, JP;

Noriyuki Oikawa, Kyoto, JP;

Assignee:

OMRON Corporation, Kyoto, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 17/10 (2006.01); G05B 19/418 (2006.01); G05B 23/02 (2006.01); G06F 17/18 (2006.01); G06N 3/02 (2006.01); G06N 5/04 (2006.01);
U.S. Cl.
CPC ...
G05B 19/41875 (2013.01); G05B 23/0221 (2013.01); G05B 23/0245 (2013.01); G05B 23/0254 (2013.01); G05B 23/0267 (2013.01); G06F 17/18 (2013.01); G06N 3/02 (2013.01); G06N 5/04 (2013.01); G05B 2219/32187 (2013.01); G05B 2219/32194 (2013.01); G05B 2219/32201 (2013.01); G05B 2219/32222 (2013.01); Y02P 90/02 (2015.11);
Abstract

A prediction model creation apparatus includes a feature amount acquisition unit that acquires values of types of feature amounts that are calculated from operating state data indicating an operating state of a production facility that produces a product, for both a normal time at which the production facility produces the product normally and a defective time at which a defect occurs in the product that is produced, a feature amount selection unit that selects a feature amount effective in predicting the defect from among the acquired types of feature amounts, based on a predetermined algorithm that specifies a degree of association between the defect and the types of feature amounts, from the values of the types of feature amounts acquired at the normal time and the defective time, and a prediction model construction unit that constructs a prediction model for predicting occurrence of the defect, using the selected feature amount.


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