The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 31, 2021
Filed:
Nov. 15, 2018
Applicant:
Rohm and Haas Electronic Materials Korea Ltd., Chungcheongnam-do, KR;
Inventors:
Yeonok Kim, Gyeonggi-do, KR;
Geun Huh, Gyeonggi-do, KR;
Ju-Young Jung, Gyeonggi-do, KR;
Jung-Hwa Lee, Gyeonggi-do, KR;
Jong Han Yang, Gyeonggi-do, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/039 (2006.01); G03F 7/075 (2006.01); G03F 7/038 (2006.01); G03F 7/023 (2006.01); C08G 77/392 (2006.01); C08G 77/388 (2006.01); H01L 27/12 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0392 (2013.01); C08G 77/388 (2013.01); C08G 77/392 (2013.01); G03F 7/0233 (2013.01); G03F 7/038 (2013.01); G03F 7/0757 (2013.01); G03F 7/023 (2013.01); H01L 27/1218 (2013.01);
Abstract
The present invention relates to a positive-type photosensitive resin composition and a cured film prepared therefrom. The positive-type photosensitive resin composition comprises an acrylic resin and a siloxane copolymer containing a sulfonated diazoquinone group at the terminal thereof. Thus, the film retention rate and adhesiveness can be further enhanced, while the sensitivity is maintained.