The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 31, 2021
Filed:
Apr. 01, 2019
Canon Kabushiki Kaisha, Tokyo, JP;
Hiroyuki Kondo, Utsunomiya, JP;
CANON KABUSHIKI KAISHA, Tokyo, JP;
Abstract
An imprint apparatus performs an imprint process for forming a pattern of a cured product of an imprint material on a substrate by using a mold. The apparatus includes a substrate holder configured to hold the substrate, a substrate deformation mechanism configured to deform the substrate so the substrate will have a convex shape toward the mold in a state in which the substrate is held by the substrate holder, and a controller configured to control the deformation of the substrate by the substrate deformation mechanism in accordance with orientation information related to a crystal orientation of the substrate and a target shot region on which the imprint process is to be performed among a plurality of shot regions on the substrate.