The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 31, 2021
Filed:
Aug. 22, 2018
Fujifilm Corporation, Tokyo, JP;
Kazutaka Takahashi, Haibara-gun, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
Provided is a radiation-sensitive composition with which a pattern having excellent infrared shielding properties and excellent rectangularity can be formed. In addition, provided are an optical filter, a laminate, a pattern forming method, a solid image pickup element, an image display device, and an infrared sensor. This radiation-sensitive composition includes: a near infrared absorber; a resin; a radically polymerizable compound; and a photoradical polymerization initiator, in which the radiation-sensitive composition has an absorption maximum in a wavelength range of 700 to 1000 nm, a ratio absorbance Amax/absorbance A550 of an absorbance Amax at the absorption maximum to an absorbance A550 at a wavelength of 550 nm is 50 to 500, the resin includes a resin having an acid group, and a mass ratio radically polymerizable compound/resin having an acid group of the radically polymerizable compound to the resin having an acid group is 0.3 to 0.7.