Multi moire structured illumination microscopy with high index materials

Abstract

A system comprising: a high index dielectric configured to: a) create a bi-periodic interference pattern of two standing sinusoidal waves on illumination by two pairs of counter-propagating sinusoidal light beams at different incident angles, wherein the incident angles are selected in accordance with the index of refraction of the high index dielectric to i) to 5 determine the spatial frequency of each counter-propagating light beam pair, and ii) cause total internal reflection, and b) generate, from the bi-periodic interference pattern, an evanescent bi-periodic standing sinusoidal wave; a light source configured to illuminate the high index dielectric with the two pairs of counter-propagating sinusoidal light beams at the different incident angles and thereby illuminate a fluorescing object positioned at the surface of the high index dielectric with the generated evanescent bi-periodic standing sinusoidal wave; and one or more delay lines configured to independently modify the initial phase of each counter-propagating light beam pair.