The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 31, 2021

Filed:

Sep. 28, 2017
Applicant:

Commissariat a L'energie Atomique ET Aux Energies Alternatives, Paris, FR;

Inventors:

Frédéric Schuster, St Germain-en-Laye, FR;

Fernando Lomello, Gif-sur-Yvette, FR;

Francis Maury, Labege, FR;

Alexandre Michau, Toulouse, FR;

Raphaël Boichot, Domene, FR;

Michel Pons, La Tronche, FR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/448 (2006.01); C23C 16/18 (2006.01); C23C 16/56 (2006.01); C23C 16/32 (2006.01); C23C 16/34 (2006.01); C23C 16/36 (2006.01); G21C 3/07 (2006.01);
U.S. Cl.
CPC ...
C23C 16/4486 (2013.01); C23C 16/18 (2013.01); C23C 16/32 (2013.01); C23C 16/34 (2013.01); C23C 16/36 (2013.01); C23C 16/56 (2013.01); G21C 3/07 (2013.01);
Abstract

Process for manufacturing a nuclear component that includes i) a support containing a substrate based on a metal, the substrate being coated or not coated with an interposed layer positioned between the substrate and at least one protective layer and ii) the protective layer composed of a protective material including partially metastable chromium; the process includes a step a) of vaporizing a mother solution followed by a step b) of depositing the protective layer onto the support via a process of chemical vapor deposition of an organometallic compound by direct liquid injection (DLI-MOCVD).


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