The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 31, 2021

Filed:

Sep. 24, 2018
Applicant:

Hitachi Kokusai Electric Inc., Tokyo, JP;

Inventor:

Atsushi Sano, Toyama, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/44 (2006.01); H01L 21/3205 (2006.01); C23C 16/06 (2006.01); C23C 16/56 (2006.01); C23C 16/46 (2006.01); C23C 16/52 (2006.01); C23C 16/54 (2006.01); H01L 21/67 (2006.01); C23C 16/458 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
C23C 16/4412 (2013.01); C23C 16/06 (2013.01); C23C 16/4583 (2013.01); C23C 16/46 (2013.01); C23C 16/52 (2013.01); C23C 16/54 (2013.01); C23C 16/56 (2013.01); H01L 21/02186 (2013.01); H01L 21/02271 (2013.01); H01L 21/32051 (2013.01); H01L 21/67017 (2013.01); H01L 21/6719 (2013.01);
Abstract

Embodiments of the invention relate to a substrate processing apparatus. In one embodiment, a substrate processing apparatus includes a plurality of process units. The process unit includes a process chamber for processing a substrate, an exhaust conduit connected to the process chamber and an exhaust pump arranged in the path of the exhaust conduit. The substrate processing apparatus further includes a connecting conduit connected to the exhaust conduits of the process units in the upstream of the exhaust pump and a switching unit which switches an exhaust path of the process chamber to the other exhaust pump in the other process unit via the connecting conduit.


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