The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 31, 2021

Filed:

Oct. 29, 2018
Applicant:

Lg Display Co., Ltd., Seoul, KR;

Inventors:

Hyungseok Bang, Daegu, KR;

Joonghwan Yang, Daegu, KR;

Dongwook Choi, Daegu, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/04 (2006.01); C23C 14/24 (2006.01); H01L 27/32 (2006.01); H01L 51/00 (2006.01);
U.S. Cl.
CPC ...
C23C 14/042 (2013.01); C23C 14/24 (2013.01); H01L 27/3211 (2013.01); H01L 51/0011 (2013.01);
Abstract

A deposition apparatus, such as an ultra-fine pattern deposition apparatus is provided. A deposition apparatus includes a base substrate, a heating assembly, a deposition source material and a pattern guide. The heating assembly has at least a part thereof included in the base substrate. The deposition source material is disposed on the heating assembly. The pattern guide overlies the base substrate and has a portion thereof above the heating assembly and the deposition source material. The pattern guide has an opening including a laterally recessed lower region and an upper region. The opening extends from an upper surface of the base substrate to an upper surface of the pattern guide. The lower region of the opening is wider than the upper region of the opening, and the opening of the pattern guide is configured to guide a material emitted from the deposition source material to a target region on a target substrate that is spaced apart from the base substrate.


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