The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 24, 2021
Filed:
Mar. 23, 2018
Nanjing University, Jiangsu, CN;
Haowen Ma, Jiangsu, CN;
Zhijian Huang, Jiangsu, CN;
Yi Shi, Jiangsu, CN;
Feng Yan, Jiangsu, CN;
Limin Zhang, Jiangsu, CN;
Xiaofeng Bu, Jiangsu, CN;
Yuqian Li, Jiangsu, CN;
Zhangnan Li, Jiangsu, CN;
Xiangshun Kong, Jiangsu, CN;
Cheng Mao, Jiangsu, CN;
Cheng Yang, Jiangsu, CN;
Xu Cao, Jiangsu, CN;
NANJING UNIVERSITY, Jiangsu, CN;
Abstract
A two-by-two array consists of four pixels. Each pixel comprises one light-sensing transistor and one reading transistor. Both the light sensing transistor and the reading transistor are formed above a same P-type semiconductor substrate, and have a composite dielectric gate structure. The substrates of the four reading transistors are connected to form a regular octagonal ring structure located in the center of the array. On four sides of the regular octagonal ring structure, four heavily-doped N+ regions are formed on the substrates not covered with the composite dielectric gate, of which every two regions are opposite to each other and form right angles, wherein two opposite heavily-doped N+ regions are connected to form a shared N+ source, and the other two are connected to form a shared N+ drain.