The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 24, 2021

Filed:

Aug. 29, 2019
Applicant:

Toshiba Memory Corporation, Minato-ku, JP;

Inventors:

Ken Komiya, Nagoya, JP;

Takamasa Ito, Nagoya, JP;

Naoki Yamamoto, Kuwana, JP;

Yu Hirotsu, Kuwana, JP;

Kazuhiro Tomishige, Yokkaichi, JP;

Yoshinori Nakakubo, Yokkaichi, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/11556 (2017.01); H01L 27/11519 (2017.01); H01L 27/11565 (2017.01); H01L 27/11582 (2017.01); H01L 23/532 (2006.01); H01L 21/02 (2006.01); H01L 21/311 (2006.01);
U.S. Cl.
CPC ...
H01L 27/11556 (2013.01); H01L 23/53295 (2013.01); H01L 27/11519 (2013.01); H01L 27/11565 (2013.01); H01L 27/11582 (2013.01); H01L 21/0217 (2013.01); H01L 21/02211 (2013.01); H01L 21/02271 (2013.01); H01L 21/31111 (2013.01);
Abstract

A semiconductor memory device includes: a substrate including a first and a second regions; first wiring layers disposed in a first direction; a second wiring layer; a third wiring layer closer to the substrate than the first and the second wiring layers; a semiconductor film that penetrates the first and the second wiring layers, and is connected to the third wiring layer; and a gate insulating film disposed between the semiconductor film and the first wiring layers. The first wiring layers include first conductive films opposed to the semiconductor film in the first region, and first films in the second region. The second wiring layer includes a second conductive film opposed to the semiconductor film in the first region, and a second film in the second region. The second film is different from the first films.


Find Patent Forward Citations

Loading…