The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 24, 2021
Filed:
Jan. 25, 2019
Applicant:
Materion Corporation, Mayfield Heights, OH (US);
Inventors:
Xingbo Yang, Phoenix, AZ (US);
Dejan Stojakovic, Boerne, TX (US);
Matthew J. Komertz, New Fairfield, CT (US);
Arthur V. Testanero, New Fairfield, CT (US);
Assignee:
Materion Corporation, Mayfield Heights, OH (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/34 (2006.01); C23C 14/34 (2006.01); C22C 19/07 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3426 (2013.01); C23C 14/3414 (2013.01); C22C 19/07 (2013.01); H01J 2237/3322 (2013.01);
Abstract
Methods for making a high purity (>99.99%) and low oxygen (<40 ppm) sputtering target containing Co, CoFe, CoNi, CoMn, CoFeX (X=B, C, Al), Fe, FeNi, or Ni alloys with a column microstructure framed by boron intermetallics are disclosed. The sputtering target is made by directional casting a molten mixture of the metal alloy, annealing to remove residual stresses, slicing, and optional annealing and finishing to obtain the sputtering target.