The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 24, 2021
Filed:
Dec. 20, 2017
Shenzhen China Star Optoelectronics Semiconductor Display Technology Co., Ltd., Shenzhen, CN;
Wei Ren, Shenzhen, CN;
Abstract
The present disclosure provides a method and an apparatus for manufacturing an alignment film. The method may include: forming an alignment material layer on a substrate; moving the substrate at a first speed and irradiating perpendicularly the alignment material layer with a first light emitted by a light source; moving the substrate at a second speed and irradiating the alignment material layer with a second light emitted by the light source, wherein a first angle between an incident direction of the second light and the substrate may prevent interference of an incident light and a reflected light of the alignment material layer. Therefore, the implementation of the present disclosure may improve the uniformity of the alignment capacity of the alignment film.