The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 24, 2021

Filed:

Mar. 15, 2019
Applicant:

Banner Engineering Corp., Plymouth, MN (US);

Inventors:

Eric K. Lindmark, Shoreview, MN (US);

Dennis R. Luer, Maple Grove, MN (US);

Assignee:

BANNER ENGINEERING CORP., Plymouth, MN (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G01V 8/14 (2006.01);
U.S. Cl.
CPC ...
G01V 8/14 (2013.01);
Abstract

Apparatus and associated methods relate to a photoelectric sensor system having a transmitter and a receiver, and at least one aperture module configured to modify a nominal field of view (FOV) of the transmitter and/or receiver, such that an overlap between the transmitter and receiver FOVs is controlled. In an illustrative example, the aperture module may be a plate having respective receiver and transmitter apertures. The transmitter and/or receiver apertures may be aligned or slightly offset from respective transmitter and receiver optical axes. The transmitter and/or receiver apertures may have a specific size/shape/position that produces a custom predetermined FOV overlap. At least one registration/alignment pin may extend through the aperture plate, a baffle, and a lens module to control orientation. The photoelectric sensor system may advantageously (1) be more resistant to the 'white card effect,' (2) increase maximum sensor range, and (3) control the shape/size/overlap of the FOVs.


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