The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 24, 2021
Filed:
Sep. 20, 2019
Applicant:
Taimide Tech. Inc., Hsinchu, TW;
Inventors:
Yi-Hsueh Ho, Hsinchu, TW;
Yi-Ting Liu, Hsinchu, TW;
Assignee:
TAIMIDE TECH. INC., Hsinchu, TW;
Primary Examiner:
Int. Cl.
CPC ...
C08J 5/18 (2006.01); C08F 22/38 (2006.01); C08F 22/04 (2006.01);
U.S. Cl.
CPC ...
C08J 5/18 (2013.01); C08F 22/04 (2013.01); C08F 22/38 (2013.01); C08J 2379/08 (2013.01);
Abstract
A transparent polyimide film manufacturing method includes following steps: producing a polyimide film having a tensile modulus of elasticity greater than 5.4 GPa ((N/m)×109), a light transmittance greater than 85%, and a chromaticity b* less than 2; providing an ether-free dianhydride and a diamine to form an ether-free polyamic acid; reacting the ether-free polyamic acid with an aromatic cyclic dianhydride to form a copolymerized polyamic acid; and chemically cyclizing the copolymerized polyamic acid to form a transparent polyimide film.