The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 24, 2021
Filed:
Mar. 15, 2019
International Business Machines Corporation, Armonk, NY (US);
Dylan J. Boday, Tucson, AZ (US);
Jeannette M. Garcia, San Leandro, CA (US);
James L. Hedrick, Pleasanton, CA (US);
Rudy J. Wojtecki, San Jose, CA (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
In an embodiment, a polymeric material includes a plurality of hemiaminal units bonded together by a first linkage and a second linkage, wherein the first linkage is thermally stable and resistant to bases and the second linkage is thermally degradable and degradable by a base. In another embodiment, a method of forming nanoporous materials includes forming a polymer network with a chemically removable portion. The chemically removable portion may be polycarbonate polymer that is removable on application of heat or exposure to a base, or a polyhexahydrotriazine (PHT) or polyhemiaminal (PHA) polymer that is removable on exposure to an acid. Removing any portion of the polymer results in formation of nanoscopic pores as polymer chains are decomposed, leaving pores in the polymer matrix.