The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 24, 2021

Filed:

Jan. 31, 2018
Applicant:

Zeon Corporation, Tokyo, JP;

Inventor:

Shunjin Aihara, Tokyo, JP;

Assignee:

ZEON CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08C 19/36 (2006.01); C08L 51/04 (2006.01);
U.S. Cl.
CPC ...
C08C 19/36 (2013.01); C08L 51/04 (2013.01); C08L 2312/00 (2013.01);
Abstract

A method for producing a modified polymer latex includes: adding a carboxyl group-containing compound, an anionic surfactant having a weight-average molecular weight of less than 500, and an anionic surfactant having a weight-average molecular weight of 500 or more to a polyisoprene latex; and reacting the polyisoprene with the carboxyl group-containing compound in a presence of the anionic surfactant having a weight-average molecular weight of less than 500 and the anionic surfactant having a weight-average molecular weight of 500 or more.


Find Patent Forward Citations

Aihara, Shunjin. (2021). Modified polymer latex production method (U.S. Patent No. 11098136). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11098136

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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