The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 24, 2021

Filed:

Mar. 06, 2019
Applicant:

Korea Institute of Science and Technology, Seoul, KR;

Inventors:

Byung Chui Lee, Seoul, KR;

Jin Soo Park, Seoul, KR;

Mintack Oh, Seoul, KR;

Jin Hyun Kim, Seoul, KR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B81C 1/00 (2006.01); H01L 41/09 (2006.01); H01L 41/113 (2006.01); H01L 21/762 (2006.01); H01L 29/78 (2006.01);
U.S. Cl.
CPC ...
B81C 1/00158 (2013.01); B81C 1/00182 (2013.01); H01L 21/76254 (2013.01); H01L 41/098 (2013.01); H01L 41/0926 (2013.01); H01L 41/0973 (2013.01); H01L 41/1138 (2013.01); B81B 2201/0264 (2013.01); H01L 29/7847 (2013.01);
Abstract

A membrane device includes a trench substrate having trenches and a membrane having wrinkles. The membrane is not bonded to the trenches of the trench substrate but is bonded to the surface of the trench substrate in the shoulders of the trenches. Hills and valleys are alternately arranged in the membrane along the trenches. The membrane device can be used in various applications (for example, sensors) based on variations in the electrical properties of the membrane caused by a change in the shape of the wrinkles (a change in the strain) of the membrane in response to a change in the internal or external environment of the trenches.


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