The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 24, 2021

Filed:

Jan. 31, 2019
Applicant:

Hermes Epitek Corp., Taipei, TW;

Inventors:

Yung-Min Pai, Taichung, TW;

Pao-Chi Chi, Taoyuan, TW;

Jih-Jenn Huang, HsinChu, TW;

Assignee:

Hermes Epitek Corp., Taipei, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05B 12/20 (2018.01); B05B 15/60 (2018.01);
U.S. Cl.
CPC ...
B05B 12/20 (2018.02); B05B 15/60 (2018.02);
Abstract

A slurry spraying mask includes a holding portion and a mask portion. The holding portion includes a holding portion opening. The mask portion includes a first layer and a second layer. The first layer includes a first tapered structure, the second layer includes a second tapered structure. The first tapered structure and the second tapered structure are arranged coaxially. A gap exists between the first layer and the second layer. The apex of the first tapered structure includes a first aperture, the apex of the second tapered structure includes a second aperture, and the second aperture is overlapped with the first aperture. The apex of the second tapered structure passes through the holding portion opening such that the mask portion is localized to the holding portion.


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