The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 24, 2021

Filed:

Aug. 20, 2018
Applicant:

Neuronexus Technologies, Inc., Ann Arbor, MI (US);

Inventor:

John P. Seymour, Ann Arbor, MI (US);

Assignee:

Neuronexus Technologies, Inc., Ann Arbor, MI (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61B 5/24 (2021.01); A61N 1/05 (2006.01); A61B 5/00 (2006.01); A61N 1/04 (2006.01);
U.S. Cl.
CPC ...
A61B 5/24 (2021.01); A61B 5/68 (2013.01); A61N 1/04 (2013.01); A61N 1/05 (2013.01); A61B 2562/0285 (2013.01); A61B 2562/125 (2013.01); A61N 1/0534 (2013.01);
Abstract

A method for providing a neural interface system. At least one primary metallization layer is deposited on a substrate. The primary metallization layer has a thickness. A monolayer of nanospheres is deposited in a substantially uniform distribution. The nanospheres contact an upper surface of the primary metallization layer. The upper surface of the primary metallization layer not contacted by the nanospheres is treated to form a plurality of undulating structures having a substantially uniform arrangement. The treating comprises etching recesses part-way through the thickness of exposed portions of the primary metallization layer from the upper surface thereof.


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