The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 17, 2021
Filed:
Nov. 03, 2017
Stc.unm, Albuquerque, NM (US);
James Plusquellic, Albuquerque, NM (US);
Wenjie Che, Albuquerque, NM (US);
Other;
Abstract
The Distribution Effect is proposed for the HELP PUF that is based on purposely introducing biases in the mean and range parameters of path delay distributions to enhance entropy. The biased distributions are then used in the bitstring construction process to introduce differences in the bit values associated with path delays that would normally remain fixed. Offsets are computed to fine tune a token's digitized path delays as a means of maximizing entropy and reproducibility in the generated bitstrings: a first population-based offset method computes median values using data from multiple tokens (i.e., the population) and a second chip-specific technique is proposed which fine tunes path delays using enrollment data from the authenticating token.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile