The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 17, 2021

Filed:

Oct. 21, 2019
Applicant:

Infineon Technologies Dresden Gmbh & Co. KG, Dresden, DE;

Inventors:

Rolf Weis, Dresden, DE;

Ahmed Mahmoud, Munich, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/06 (2006.01); H01L 21/265 (2006.01); H01L 29/66 (2006.01); H01L 29/78 (2006.01); H01L 21/324 (2006.01);
U.S. Cl.
CPC ...
H01L 29/0634 (2013.01); H01L 21/26513 (2013.01); H01L 21/324 (2013.01); H01L 29/66681 (2013.01); H01L 29/7816 (2013.01);
Abstract

A transistor arrangement and a method are disclosed. The transistor arrangement includes: a plurality of first semiconductor regions of a first doping type and a plurality of second semiconductor regions of a second doping type, the first semiconductor regions and the second semiconductor regions being arranged alternatingly in a vertical direction of a semiconductor body; a source region adjoining the plurality of first semiconductor regions; a drain region adjoining the plurality of second semiconductor regions and arranged spaced apart from the source region in a first lateral direction; and a plurality of gate regions each of which adjoins at least one of the plurality of second semiconductor regions and is arranged between the source region and the drain region. At least one of the first and semiconductor regions, but less than each of the first and second semiconductor regions has a doping dose that varies in the first lateral direction.


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