The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 17, 2021

Filed:

Feb. 11, 2019
Applicant:

Canon Kabushiki Kaisha, Tokyo, JP;

Inventors:

Daichi Seto, Yokohama, JP;

Junji Iwata, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/146 (2006.01); H01L 31/02 (2006.01); H01L 31/18 (2006.01);
U.S. Cl.
CPC ...
H01L 27/14643 (2013.01); H01L 27/1461 (2013.01); H01L 27/1463 (2013.01); H01L 27/14603 (2013.01); H01L 27/14612 (2013.01); H01L 27/14679 (2013.01);
Abstract

An image capturing device is provided. The device comprises a photodiode including a first semiconductor region of a first conductivity type and a second semiconductor region of a second conductivity type, a third semiconductor region of the second conductivity type, an insulator arranged between the photodiode and the third semiconductor region and a channel stop region of the first conductivity type which covers a side and a bottom surface of the insulator. The channel stop region includes a fourth semiconductor region arranged between the insulator and the second semiconductor region and a fifth semiconductor region arranged between the insulator and the third semiconductor region. An impurity concentration in the fourth semiconductor region is higher than an impurity concentration in the fifth semiconductor region and the impurity concentration in the fifth semiconductor region is not less than an impurity concentration in the first semiconductor region.


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