The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 17, 2021

Filed:

Aug. 13, 2019
Applicant:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Inventors:

Seung Hoon Choi, Yongin-si, KR;

Jaeung Koo, Yongin-si, KR;

Kwansung Kim, Yongin-si, KR;

Bo Yun Kim, Hwaseong-si, KR;

Wandon Kim, Seongnam-si, KR;

Boun Yoon, Seoul, KR;

Jeonghyuk Yim, Seoul, KR;

Yeryung Jeon, Suwon-si, KR;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/768 (2006.01); H01L 27/105 (2006.01); H01L 23/528 (2006.01); H01L 23/532 (2006.01); H01L 21/3105 (2006.01);
U.S. Cl.
CPC ...
H01L 21/7684 (2013.01); H01L 21/31053 (2013.01); H01L 21/76837 (2013.01); H01L 21/76877 (2013.01); H01L 23/5283 (2013.01); H01L 23/5329 (2013.01); H01L 23/53257 (2013.01); H01L 27/1052 (2013.01); H01L 21/76843 (2013.01);
Abstract

A semiconductor device and a method of fabricating a semiconductor device, the semiconductor device including a semiconductor substrate including a first region and a second region; an interlayer insulating layer on the semiconductor substrate, the interlayer insulating layer including a first opening on the first region and having a first width; and a second opening on the second region and having a second width, the second width being greater than the first width; at least one first metal pattern filling the first opening; a second metal pattern in the second opening; and a filling pattern on the second metal pattern in the second opening, wherein the at least one first metal pattern and the second metal pattern each include a same first metal material, and the filling pattern is formed of a non-metal material.


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