The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 17, 2021

Filed:

Feb. 18, 2020
Applicant:

Guardian Europe S.à R.l, Bertrange, LU;

Inventors:

Marcel Schloremberg, Habay-la-Neuve, BE;

Guy Comans, Neufchateau, BE;

Philippe Uselding, Habay-la-Neuve, BE;

Assignee:

GUARDIAN EUROPE S.À R.L., Bertrange, LU;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/34 (2006.01); C23C 14/35 (2006.01); C23C 14/34 (2006.01);
U.S. Cl.
CPC ...
H01J 37/342 (2013.01); C23C 14/3407 (2013.01); C23C 14/3442 (2013.01); C23C 14/3464 (2013.01); C23C 14/352 (2013.01); H01J 37/3417 (2013.01); H01J 37/3429 (2013.01); H01J 37/3432 (2013.01); H01J 37/3435 (2013.01);
Abstract

Certain example embodiments relate to sputtering apparatuses that include a plurality of targets such that a first one or ones of target(s) may be used for sputtering in a first mode, while a second one or ones of target(s) may be used for sputtering in a second mode. Modes may be switched in certain example embodiments by rotating the position of the targets, e.g., such that one or more target(s) to be used protrude into the main chamber of the apparatus, while one or more target(s) to be unused are recessed into a body portion of a cathode of (e.g., integrally formed with) the sputtering apparatus. The targets may be cylindrical magnetic targets or planar targets. At least one target location also may be made to accommodate an ion beam source.


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