The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 17, 2021
Filed:
Aug. 27, 2019
Applicant:
California Institute of Technology, Pasadena, CA (US);
Inventors:
Jaebum Chung, Mountain View, CA (US);
Changhuei Yang, South Pasadena, CA (US);
Assignee:
California Institute of Technology, Pasadena, CA (US);
Primary Examiner:
Int. Cl.
CPC ...
G02B 21/36 (2006.01); G02B 27/00 (2006.01); G06F 17/14 (2006.01); G01N 21/64 (2006.01); G02B 21/00 (2006.01); G02B 27/58 (2006.01);
U.S. Cl.
CPC ...
G02B 21/367 (2013.01); G01N 21/6458 (2013.01); G02B 21/0072 (2013.01); G02B 27/0025 (2013.01); G02B 27/58 (2013.01); G06F 17/14 (2013.01);
Abstract
Certain embodiments pertain to techniques for coded-aperture-based correction of sample-induced and system-induced aberration.
Chung, Jaebum. (2021). Systems and methods for coded-aperture-based correction of aberration obtained from fourier ptychography (U.S. Patent No. 11092795). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11092795
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile