The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 17, 2021

Filed:

Apr. 22, 2016
Applicant:

General Plasma, Inc., Tucson, AZ (US);

Inventor:

John E. Madocks, Tucson, AZ (US);

Assignee:

GENERAL PLASMA INC., Tucson, AZ (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
F16K 3/06 (2006.01); F16K 51/02 (2006.01); F16K 3/02 (2006.01); F16K 3/10 (2006.01); F16K 3/18 (2006.01); F16K 31/52 (2006.01);
U.S. Cl.
CPC ...
F16K 3/06 (2013.01); F16K 3/0218 (2013.01); F16K 3/0254 (2013.01); F16K 3/10 (2013.01); F16K 3/182 (2013.01); F16K 31/52 (2013.01); F16K 51/02 (2013.01);
Abstract

A chamber valve () for use in processes requiring vacuum pressures has a compact design which minimizes the space needed for the valve in the travel direction. The chamber valve gate () is moveable between a first position in which the gate is offset from the portal (), and a second position in which the gate is aligned with the portal. The gate will move into alignment with the portal while remaining within a plane parallel or nearly parallel to the portal.


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