The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 17, 2021
Filed:
Sep. 14, 2018
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventors:
Ryota Ifuku, Nirasaki, JP;
Takashi Matsumoto, Nirasaki, JP;
Assignee:
TOKYO ELECTRONICS LIMITED, Tokyo, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 16/511 (2006.01); C23C 16/26 (2006.01); C23C 16/52 (2006.01); C23C 16/452 (2006.01); C23C 16/455 (2006.01); H01L 21/02 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
C23C 16/511 (2013.01); C23C 16/26 (2013.01); C23C 16/452 (2013.01); C23C 16/45561 (2013.01); C23C 16/45565 (2013.01); C23C 16/52 (2013.01); H01J 37/3222 (2013.01); H01J 37/3244 (2013.01); H01J 37/32311 (2013.01); H01J 37/32724 (2013.01); H01L 21/0259 (2013.01); H01L 21/0262 (2013.01); H01L 21/02381 (2013.01); H01L 21/02425 (2013.01); H01L 21/02488 (2013.01); H01L 21/02491 (2013.01); H01L 21/02527 (2013.01); H01J 2237/3321 (2013.01); Y10S 977/844 (2013.01);
Abstract
A graphene structure forming method for forming a graphene structure is provided. The method comprises preparing a target substrate, and forming the graphene structure on a surface of the target substrate by remote microwave plasma CVD using a carbon-containing gas as a film-forming raw material gas in a state in which the surface of the target substrate has no catalytic function.