The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 17, 2021
Filed:
Apr. 18, 2019
Applicants:
Samsung Electronics Co., Ltd., Suwon-si, KR;
Soulbrain Co., Ltd., Seongnam-si, KR;
Inventors:
Yongtae Kim, Seongnam-si, KR;
Junghun Lim, Seongnam-si, KR;
Soojin Kim, Seoul, KR;
Jung-Min Oh, Incheon, KR;
Seungmin Jeon, Suwon-si, KR;
Hayoung Jeon, Hwaseong-si, KR;
Assignees:
SAMSUNG ELECTRONICS CO., LTD., Suwon-si, KR;
Soulbrain Co., Ltd., Seongnam-si, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09K 13/08 (2006.01); H01L 21/02 (2006.01); H01L 21/306 (2006.01); H01L 29/786 (2006.01); H01L 29/66 (2006.01); H01L 29/06 (2006.01); H01L 29/423 (2006.01);
U.S. Cl.
CPC ...
C09K 13/08 (2013.01); H01L 21/02532 (2013.01); H01L 21/02603 (2013.01); H01L 21/30604 (2013.01); H01L 29/0673 (2013.01); H01L 29/42392 (2013.01); H01L 29/66545 (2013.01); H01L 29/66742 (2013.01); H01L 29/78696 (2013.01);
Abstract
Provided are an etching composition and a method for manufacturing a semiconductor device using the same. According to embodiments, the etching composition may comprise from about 15 wt % to about 75 wt % of peracetic acid; a fluorine compound; an amine compound; and an organic solvent.