The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 17, 2021

Filed:

Apr. 22, 2020
Applicant:

Enf Technology Co., Ltd., Yongin-si, KR;

Inventors:

Hye Hee Lee, Seoul, KR;

Hyeon Woo Park, Yongin-si, KR;

Myung Ho Lee, Hwaseong-si, KR;

Myung Geun Song, Yongin-si, KR;

Assignee:

ENF TECHNOLOGY CO., LTD., Yongin-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09K 13/06 (2006.01);
U.S. Cl.
CPC ...
C09K 13/06 (2013.01);
Abstract

Provided are an etching composition and an etching method using the same, and more particularly, an etching composition for selectively etching a metal nitride film, an etching method of the metal nitride film using the same, and a method of manufacturing a microelectronic device including a process performed using the same.


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