The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 17, 2021
Filed:
Nov. 03, 2015
Fasver, Baillargues, FR;
Eric Philippe, Eyguieres, FR;
Laurence Bes, Jacou, FR;
Illinois Tool Works Inc., Glenview, IL (US);
Abstract
Disclosed is a method for manufacturing a multilayer data medium (), in which method: a multilayer data medium, including at least one transparent security layer (), and at least one marking layer (), sensitive to electromagnetic-marking radiation (), are selected; the transparent security layer () includes at least one semi-transparent printed image including at least one thermochromic dye; at least one marking () is made using the electromagnetic-marking radiation, through the printed image; the semi-transparent printed image reveals, in a first state referred to as the inactivated state, at least one semi-transparent visible pattern that makes it possible, after the marking step, to view the marking () through the image, the pattern not being visible in a second state, referred to as the activated state. The invention also relates to a multilayer data medium ().