The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 17, 2021

Filed:

Mar. 30, 2017
Applicant:

Semiconductor Energy Laboratory Co., Ltd., Kanagawa-ken, JP;

Inventors:

Sachiko Kawakami, Kanagawa, JP;

Yasushi Kitano, Kanagawa, JP;

Kanata Abe, Kanagawa, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D 7/02 (2006.01); B01D 7/00 (2006.01); B01D 1/14 (2006.01); C07B 63/00 (2006.01); C09K 11/06 (2006.01); H01L 51/00 (2006.01); H01L 51/50 (2006.01); H01L 51/56 (2006.01); H01L 51/52 (2006.01);
U.S. Cl.
CPC ...
B01D 7/02 (2013.01); B01D 1/14 (2013.01); B01D 7/00 (2013.01); C07B 63/00 (2013.01); C09K 11/06 (2013.01); H01L 51/0025 (2013.01); H01L 51/5012 (2013.01); H01L 51/5064 (2013.01); H01L 51/56 (2013.01); H01L 51/5278 (2013.01);
Abstract

A novel sublimation purification method is provided. Moreover, a novel sublimation purification apparatus is provided. A purification method using a purification apparatus including a purification portion where a substance is purified by vaporization, a temperature adjustment means, a gas supply means, and a gas discharge means is provided. In the purification method, the inside of the purification portion is made to have a first pressure with use of the gas discharge means, a temperature gradient is generated in the purification portion with use of the temperature adjustment means such that the substance is purified, the pressure in the purification portion is then set at a second pressure with use of the gas supply means, and the purification portion is cooled with use of the temperature adjustment means. The second pressure is higher than the first pressure and the second pressure is higher than or equal to an atmospheric pressure.


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