The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 17, 2021
Filed:
Apr. 17, 2019
The Procter & Gamble Company, Cincinnati, OH (US);
Timothy Ian Mullane, Union, KY (US);
Kelyn Anne Arora, Cincinnati, OH (US);
Jill Marlene Orr, Liberty Township, OH (US);
Donald Carroll Roe, West Chester, OH (US);
Jennifer Schutte, Cincinnati, OH (US);
John Brian Strube, Okeana, OH (US);
Ann Cecilia Tapp, West Chester, OH (US);
Rachael Eden Walther, Union, KY (US);
Amanda Margaret Bicking, Cincinnati, OH (US);
Jennifer Lynn Dusold, Cincinnati, OH (US);
Margaret Elizabeth Porter, Cincinnati, OH (US);
The Procter & Gamble Company, Cincinnati, OH (US);
Abstract
Patterned apertured webs are provided. The patterned apertured webs include a plurality of land areas and a plurality of apertures defined in the patterned apertured webs. At least some land areas of the plurality of land areas surround at least some apertures of the plurality of apertures. The patterned apertured webs have an Effective Open Area in the range of about 3% to about 30%, according to the Aperture Test.