The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 10, 2021

Filed:

Jul. 06, 2020
Applicant:

Altia Systems Inc, Cupertino, CA (US);

Inventors:

Yashket Gupta, Santa Clara, CA (US);

Naveed Alam, Cupertino, CA (US);

Aurangzeb Khan, Portola Valley, CA (US);

Ted Vucurevich, Cupertino, CA (US);

Assignee:

ALTIA SYSTEMS INC, Cupertino, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H04N 13/00 (2018.01); H04N 13/243 (2018.01); H04N 5/232 (2006.01); G06T 3/40 (2006.01);
U.S. Cl.
CPC ...
H04N 13/243 (2018.05); G06T 3/4038 (2013.01); H04N 5/23238 (2013.01);
Abstract

A three-dimensional imaging system for generating a 3D panoramic video/image is disclosed. The three-dimensional imaging system includes a plurality of stereoscopic pairs of compound cameras which are separated by a predefined distance d. The imaging system is configured to operate in a first mode to generate panoramic images simultaneously using the compound cameras. Spatial distortion and temporal distortion are calculated for each column in a region of overlap of the field of view of the panoramic images generated. The column for which the spatial and temporal distortion is minimum is marked as a seam location. The marked seam location is changed based on location of a motion in the column for which the calculated spatial and temporal distortion is minimum.


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