The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 10, 2021

Filed:

Nov. 02, 2020
Applicant:

Aptiv Technologies Limited, St. Michael, BB;

Inventors:

Ronald M. Taylor, Greentown, IN (US);

James Nicholas Nickolaou, Clarkston, MI (US);

Assignee:

Aptiv Technologies Limited, St. Michael, BB;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H04N 5/225 (2006.01); H04N 5/232 (2006.01);
U.S. Cl.
CPC ...
H04N 5/22521 (2018.08); H04N 5/232122 (2018.08);
Abstract

The techniques of this disclosure relate to a system for adjusting a focus of an image. A system includes a phased metalens configured to adjust a focus of an image detected by an imaging substrate of an image sensor. The phased metalens is further configured to adjust a property of light that reaches the imaging substrate based on a change in a flatness of the imaging substrate. The property of the light that reaches the imaging substrate includes a phase of all the light that reaches the imaging substrate at a same time. The phased metalens accomplishes this by achieving near-diffraction-limited focusing over the incoming light wavelengths using precisely defined nanoscale subwavelength resolution structures.


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