The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 10, 2021
Filed:
Jan. 22, 2020
Applicant:
Universal Display Corporation, Ewing, NJ (US);
Inventors:
William E. Quinn, Whitehouse Station, NJ (US);
Siddharth Harikrishna Mohan, Plainsboro, NJ (US);
Gregory McGraw, Yardley, PA (US);
Xin Xu, Plainsboro, NJ (US);
Assignee:
Universal Display Corporation, Ewing, NJ (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01L 51/00 (2006.01); C23C 14/24 (2006.01); C23C 14/12 (2006.01); C23C 14/04 (2006.01); C23C 14/54 (2006.01); B41J 2/14 (2006.01); B41M 3/00 (2006.01); H01L 51/56 (2006.01); H01L 51/50 (2006.01);
U.S. Cl.
CPC ...
H01L 51/0003 (2013.01); B41J 2/14 (2013.01); B41M 3/006 (2013.01); C23C 14/042 (2013.01); C23C 14/12 (2013.01); C23C 14/24 (2013.01); C23C 14/54 (2013.01); H01L 51/0013 (2013.01); H01L 51/56 (2013.01); H01L 51/5004 (2013.01); H01L 2251/552 (2013.01);
Abstract
Methods and devices for controlling pressures in microenvironments between a deposition apparatus and a substrate are provided. Each microenvironment is associated with an aperture of the deposition apparatus which can allow for control of the microenvironment.