The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 10, 2021

Filed:

Jan. 12, 2018
Applicant:

Sandisk Technologies Llc, Plano, TX (US);

Inventors:

Federico Nardi, San Jose, CA (US);

Christopher J Petti, Mountain View, CA (US);

Gerrit Jan Hemink, San Ramon, CA (US);

Assignee:

SanDisk Tehnologies LLC, Addison, TX (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 27/24 (2006.01); H01L 45/00 (2006.01); G11C 13/00 (2006.01); G11C 11/56 (2006.01); H01L 29/786 (2006.01);
U.S. Cl.
CPC ...
H01L 27/249 (2013.01); G11C 11/5678 (2013.01); G11C 13/004 (2013.01); G11C 13/0004 (2013.01); G11C 13/0069 (2013.01); G11C 13/0097 (2013.01); H01L 27/2427 (2013.01); H01L 27/2454 (2013.01); H01L 27/2463 (2013.01); H01L 45/06 (2013.01); H01L 45/1233 (2013.01); H01L 45/1253 (2013.01); H01L 45/144 (2013.01); H01L 45/1683 (2013.01); G11C 13/0064 (2013.01); G11C 2013/005 (2013.01); G11C 2013/0092 (2013.01); G11C 2213/51 (2013.01); G11C 2213/52 (2013.01); G11C 2213/71 (2013.01); G11C 2213/75 (2013.01); G11C 2213/76 (2013.01); G11C 2213/79 (2013.01); H01L 29/78642 (2013.01);
Abstract

A non-volatile memory uses phase change memory (PCM) cells in a three dimensional vertical cross-point structure, in which multiple layers of word lines run in a horizontal direction and bit lines run in a vertical direction. The memory cells are located in a recessed region of the word lines and are separated from the bit line by an ovonic threshold switch. A surfactant lining of the word line recess in which the phase change memory material is placed improves stability of the resistance state of the memory cells, allowing for improved multi-state operation.


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