The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 10, 2021

Filed:

Mar. 29, 2018
Applicant:

Asm Ip Holding B.v., Almere, NL;

Inventors:

Dieter Pierreux, Dilbeek, BE;

Werner Knaepen, Leuven, BE;

Bert Jongbloed, Oud-Heverlee, BE;

Cornelis Thaddeus Herbschleb, Leiden, NL;

Hessel Sprey, Kessel-Lo, BE;

Assignee:

ASM IP Holding B.V., Almere, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/673 (2006.01); H01L 21/306 (2006.01); H01L 21/67 (2006.01); C23C 16/48 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67346 (2013.01); C23C 16/482 (2013.01); H01L 21/0223 (2013.01); H01L 21/30604 (2013.01); H01L 21/67063 (2013.01);
Abstract

The invention relates to a substrate rack and a substrate processing system for processing substrates in a reaction chamber. The substrate rack may be used for introducing a plurality of substrates in the reaction chamber. The substrate rack may have a plurality of spaced apart substrate holding provisions configured to hold the substrates in a spaced apart relationship. The rack may have an illumination system to irradiate radiation with a range from 100 to 500 nanometers onto a top surface of the substrates.


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