The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 10, 2021
Filed:
Jan. 29, 2019
Applicant:
Toshiba Memory Corporation, Minato-ku, JP;
Inventor:
Hiroyuki Mizuno, Kuwana, JP;
Assignee:
TOSHIBA MEMORY CORPORATION, Minato-ku, JP;
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/44 (2006.01); H01J 37/32 (2006.01); C04B 41/89 (2006.01); C04B 41/52 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32091 (2013.01); C04B 41/52 (2013.01); C04B 41/89 (2013.01); C23C 16/44 (2013.01); H01J 37/32541 (2013.01);
Abstract
According to one embodiment, a restoration method for a plasma processing apparatus is provided. The method includes performing application of a restoration liquid from a coating part onto a consumed region on a component for serving as a constituent element of the plasma processing apparatus, by controlling positions of the component and the coating part, and an application amount of the restoration liquid; and solidifying the restoration liquid applied on the component.