The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 10, 2021
Filed:
Dec. 05, 2016
Microsoft Technology Licensing, Llc, Redmond, WA (US);
Pasi Kostamo, Espoo, FI;
Microsoft Technology Licensing, LLC, Redmond, WA (US);
Abstract
Techniques for generating electronics components that operate free of unwanted distortions such as edge diffraction and unwanted phase jumps are described. A modified production master or a modified working stamp can be implemented to generate an electronic or optical component having structures that are positioned within a desired distance from a planar surface. A production master or a working stamp is modified in dependence upon a comparison of an identified distance for each respective structure to the planar surface and a desired distance. The modified production master or the modified working stamp generates the electronic or optical component by positioning the structures in accordance with the desired distance. By positioning the structures in accordance with the desired distance, electronic components generated using the modified production master or the modified working stamp minimize distortions, such as a phase jump between the structures.