The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 10, 2021
Filed:
Sep. 06, 2017
University of South Carolina, Columbia, SC (US);
Morgan Stefik, Columbia, SC (US);
Hasala N. Lokupitiya, Columbia, SC (US);
University of South Carolina, Columbia, SC (US);
Abstract
A method to quickly adjust the size of micelles and then return the micelles to a persistent state is provided. Specifically, the present invention is directed to a method for block copolymer micelle growth under high-χN solution conditions where ultrasonic cavitation facilitates rapid solution-gas interface production that accelerates micelle growth by an order of magnitude over other methods such as vortexing. The persistent micelles formed by the method of the present invention can then be used for controlled delivery of dispersions in organic electronic coatings, paint, or drug delivery applications and can also be used to control the pore size of films that include an oxide, a nitride, a carbide, a metal, or a carbon material.