The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 10, 2021
Filed:
Feb. 21, 2018
Fujifilm Corporation, Tokyo, JP;
Atsushi Hashimoto, Kanagawa, JP;
Kaku Irisawa, Kanagawa, JP;
Atsushi Osawa, Kanagawa, JP;
Tomoki Inoue, Kanagawa, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
A photoacoustic measurement device reducing artifacts caused by photoacoustic waves generated at a surface portion of a subject on which measurement light is incident, and a signal processing method thereof are obtained. A photoacoustic measurement device includes region discrimination unit that discriminates an artifact generation region and an artifact non-generation region in a photoacoustic image on the basis of a positional relationship between a light emitting portion and an acoustic wave detection portion, and filter unit that performs a first filtering process on a first photoacoustic wave detection signal corresponding to a photoacoustic image of the artifact non-generation region and performs a second filtering process on a second photoacoustic wave detection signal corresponding to a photoacoustic image of the artifact generation region. The second filtering process includes further reducing the photoacoustic wave detection signal in a frequency range lower than a predetermined frequency as compared with the first filtering process.