The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 03, 2021
Filed:
Feb. 06, 2019
Applicant:
Canon Kabushiki Kaisha, Tokyo, JP;
Inventors:
Masaya Uyama, Kawasaki, JP;
Souta Takeuchi, Fujisawa, JP;
Taichi Yonemoto, Isehara, JP;
Kazuaki Shibata, Kawasaki, JP;
Atsushi Teranishi, Kawasaki, JP;
Takeru Yasuda, Kawasaki, JP;
Atsunori Terasaki, Kawasaki, JP;
Assignee:
CANON KABUSHIKI KAISHA, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01L 21/027 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
H01L 21/0273 (2013.01); H01L 21/0206 (2013.01); H01L 21/0228 (2013.01);
Abstract
Provided is a method of forming a film on a substrate including: forming a protective member on a surface of the substrate; forming an organic structure on the surface of the substrate, at a distance from the protective member; removing the protective member after the formation of the organic structure; and forming a film by CVD in a region of the surface of the substrate from which the protective member is removed.