The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 03, 2021
Filed:
Jul. 26, 2018
Micromass Uk Limited, Wilmslow, GB;
Anatoly Verenchikov, City of Bar, ME;
Micromass UK Limited, Wilmslow, GB;
Abstract
Elongation of orthogonal accelerators is assisted by ion spatial transverse confinement within novel confinement means, formed by spatial alternation of electrostatic quadrupolar field (). Contrary to prior art RF confinement means, the static means provide mass independent confinement and may be readily switched. Spatial confinement defines ion beam () position, prevents surfaces charging, assists forming wedge and bend fields, and allows axial fields in the region of pulsed ion extraction, this way improving the ion beam admission at higher energies and the spatial focusing of ion packets in multi-reflecting, multi-turn and singly reflecting TOF MS or electrostatic traps.