The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 03, 2021

Filed:

Nov. 02, 2016
Applicant:

AZ Electronic Materials (Luxembourg) S.a.r.l., Luxembourg, LU;

Inventors:

Masato Suzuki, Kakegawa, JP;

Hiroshi Hitokawa, Kakegawa, JP;

Tomohide Katayama, Kakegawa, JP;

Assignee:

Merck Patent GmbH, Darmstadt, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/38 (2006.01); G03F 7/038 (2006.01); G03F 7/004 (2006.01); G03F 7/40 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/38 (2013.01); G03F 7/0045 (2013.01); G03F 7/038 (2013.01); G03F 7/0382 (2013.01); G03F 7/2022 (2013.01); G03F 7/40 (2013.01); G03F 7/0048 (2013.01);
Abstract

[Problem] To provide a high heat resistance resist composition and a pattern formation method using the composition. [Solution] The present invention provides a chemically amplified negative-type resist composition comprising a particular polymer and a particular crosslinking agent, and this composition makes it possible to form a resist pattern of high sensitivity, of excellent resolution and of strong heat-resistance.


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