The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 03, 2021

Filed:

Oct. 28, 2016
Applicant:

Eos Gmbh Electro Optical Systems, Krailling, DE;

Inventors:

Hans Perret, Munich, DE;

Stephan Gronenborn, Aachen, DE;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 13/00 (2006.01); G02B 19/00 (2006.01); B41J 2/45 (2006.01); G02B 13/22 (2006.01); G03F 7/20 (2006.01); B22F 12/00 (2021.01); B29C 64/264 (2017.01); B33Y 30/00 (2015.01); B29C 64/153 (2017.01); B29C 64/268 (2017.01); B22F 10/10 (2021.01); B22F 12/40 (2021.01); B22F 12/49 (2021.01); B33Y 10/00 (2015.01); B23K 26/06 (2014.01);
U.S. Cl.
CPC ...
G02B 19/0009 (2013.01); B22F 12/00 (2021.01); B29C 64/153 (2017.08); B29C 64/264 (2017.08); B29C 64/268 (2017.08); B33Y 30/00 (2014.12); B41J 2/451 (2013.01); G02B 13/22 (2013.01); G03F 7/2053 (2013.01); G03F 7/2055 (2013.01); G03F 7/70416 (2013.01); B22F 10/10 (2021.01); B22F 12/40 (2021.01); B22F 12/49 (2021.01); B23K 26/0665 (2013.01); B33Y 10/00 (2014.12);
Abstract

An exposure optics serves as an equipping and/or retrofitting optics for a device for producing a three-dimensional object by selectively solidifying building material, layer by layer. The exposure optics includes at least a first object-sided lens system having a first focal length fand a second image-sided lens system having a second focal length f, which lens systems can be arranged in the beam path of the radiation emitted by the radiation source. The focal plane of the first lens system and the focal plane of the second lens system coincide in a plane between the two lens systems. The focal length fof the first lens system is equal to or greater than the focal length fof the second lens system. The exposure optics is designed and can be arranged such that the electromagnetic radiation is incident substantially perpendicular on the working surface.


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